库号：M884683 品牌/制造商： 型号：Ta2O5靶材
Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. To speak to someone directly about current pricing or for a quote on sputtering targets and other deposition products not listed, please click here .
Tantalum oxide is an inorganic chemical compound with a chemical formula of Ta2O5. It is crystalline solid and white in appearance with a density of 8.2 g/cc, a melting point of 1,872°C, and a vapor pressure of 10-4 Torr at 1,920°C. It is mainly used to produce capacitors which can be found in auto electronics, cell phones, and tools. Tantalum oxide can also be found in the glass for camera lenses. It is evaporated under vacuum to form films for the fabrication of semiconductors, optoelectronic devices, and fuel cells.
Material Type：Tantalum Pentoxide
Color/Appearance：White, Crystalline Solid
Melting Point (°C)：1,872
Theoretical Density (g/cc)：8.2
Z Ratio ：0.3
Max Power Density(Watts/Square Inch)：20*
Type of Bond：Indium, Elastomer
Comments：Slight decomposition. Evaporate Ta in 10-3 Torr O2.